Jane P. Chang
Jane P. Chang | |
|---|---|
| Born | 1967 (age 56–57) |
| Alma mater | National Taiwan University (BS) Massachusetts Institute of Technology (MS, PhD) |
| Scientific career | |
| Fields | Electrochemistry Chemical engineering |
| Institutions | University of California Los Angeles (UCLA) |
| Thesis | Study of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterned polysilicon (1998) |
| Doctoral advisor | Herbert H. Sawin |
Jane Pei-chen Chang (born 1967) is a Taiwanese-American chemical engineer and materials scientist known for her research developing advanced atomic layer deposition (ALD) and etching techniques. Her research focuses on creating thin films and coatings with precise properties for use in microelectronics, energy devices, and other advanced materials applications.
Education
[edit]Chang earned her B.S. in chemical engineering from National Taiwan University in 1993. She completed her and M.S. and Ph.D. chemical engineering degrees from Massachusetts Institute of Technology in 1995 and 1998, respectively.[1]
Research and career
[edit]She is the William F. Seyer Chair and Professor of Chemical and Biomolecular Engineering at the UCLA. Her research centers on the synthesis and chemical processing of novel materials with a focus on atomic layer-controlled thin-film deposition and the atomistic understanding of solid-state interfaces.[2] Her lab studies plasma chemistry and surface interactions, which have contributed to advances in semiconductor processing, optoelectronic devices, and nanostructured materials. This includes efforts to develop high-κ dielectric, oxide-based films, e.g. HfO2, HfSiO4, ZrO2, for electronic devices and explore sustainable approaches to improve catalyst longevity in chemical processing.[3][4][5] These efforts have applications in electronics, microsensors, optoelectronics, solar cells, batteries, and energy storage devices.[6][7]
Chang was the first woman to receive the AVS Plasma Prize (2018), which is the highest honor of the AVS Plasma Science & Technology Division.[8]
Selected publications
[edit]- Chen, Francis F.; Chang, Jane P. (2009). Lecture Notes on Principles of Plasma Processing. Springer US. ISBN 978-0306474972.
- Choi, J.H.; Mao, Y.; Chang, J.P. (2011). "Development of hafnium based high-k materials—A review". Materials Science and Engineering R: Reports. 72 (6). Elsevier BV: 97–136. doi:10.1016/j.mser.2010.12.001. ISSN 0927-796X.
Awards and honors
[edit]- National Science Foundation CAREER Award (2000)[9]
- AVS Fellow (2013)[10]
- AVS Plasma Prize (2018)[11]
- American Institute of Chemical Engineers (AIChE) Fellow (2021)[2]
References
[edit]- ^ Chang, Jane Pei-chen (1998). Study of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterned polysilicon (Thesis). Massachusetts Institute of Technology. hdl:1721.1/50356. OCLC 39171343.
- ^ a b Ellis, Gordon (September 29, 2021). "Meet Some of AIChE's Recently Elected Fellows". www.aiche.org. American Institute of Chemical Engineers.
- ^ a b Chang, Jane P.; Lin, You-Sheng (2001-09-15). "Highly conformal ZrO2 deposition for dynamic random access memory application". Journal of Applied Physics. 90 (6). AIP Publishing: 2964–2969. doi:10.1063/1.1389756. ISSN 0021-8979.
- ^ a b Lin, Y.-S.; Puthenkovilakam, R.; Chang, J. P. (2002-09-09). "Dielectric property and thermal stability of HfO2 on silicon". Applied Physics Letters. 81 (11). AIP Publishing: 2041–2043. doi:10.1063/1.1506207. ISSN 0003-6951.
- ^ a b Tanner, Carey M.; Perng, Ya-Chuan; Frewin, Christopher; Saddow, Stephen E.; Chang, Jane P. (2007-11-12). "Electrical performance of Al2O3 gate dielectric films deposited by atomic layer deposition on 4H-SiC". Applied Physics Letters. 91 (20). AIP Publishing. doi:10.1063/1.2805742. ISSN 0003-6951.
- ^ Bodderas, Elke (November 6, 2010). "Das Körnchen ist ein Akku" (in German). Berlin: Die Welt. ProQuest 762553092.
- ^ "AVS Election Winners | Biography: Jane P. Chang". avs.org. Retrieved October 25, 2024.
- ^ "Professor Jane Chang receives 2018 AVS Plasma Prize". UCLA Samueli Chemical & Biomolecular Engineering. November 7, 2018.
- ^ "CAREER: Plasma and Surface Chemistry in Depositing and Etching Metal Oxides". www.nsf.gov. April 1, 2000. Retrieved October 23, 2024.
- ^ "Fellow of the Society | List of Fellows". avs.org. AVS Science and Technology of Materials, Interfaces, and Processing. Retrieved October 23, 2024.
- ^ "Plasma Science & Technology Division Plasma Prize | Past Winners". avs.org. AVS Science and Technology of Materials, Interfaces, and Processing. Retrieved October 23, 2024.